发明名称 PHOTOMASK AND ITS MANUFACTURE
摘要 <p>PURPOSE:To enable all the exposure faces to be in well contact condition by forming a required-pattern opening on a metal plate with etching, etc., and molding it to be put in close contact with the surface of a three-dimensional molding. CONSTITUTION:Photo resist which is applied to the surface of a metal plate is exposed to light in a patterned shape, developed to form etching resist, and given etching by using etching liquid including ferric chloride to form a patterned opening 2. A metal foil 1 with the opening 2 is assembled by bending backward along the folds 1b, 1d, 1f and frontward along the folds 1c, 1e and welding and joining the edges 3 so as to be in contact with the outside face of a molding 11. In this case, the uncontinuous portions are cut off before the metal foil 1 is bent with a polyester film inside. The polyester film on the joint 3 is removed to allow welding and joining from the outside and polishing treatment inside of the joint for good adhesion.</p>
申请公布号 JPH05323570(A) 申请公布日期 1993.12.07
申请号 JP19920157495 申请日期 1992.05.25
申请人 HITACHI CABLE LTD 发明人 KOMAGINE RIKIO;OAKU TOSHIYUKI;ASANO HIDEKI
分类号 G03F1/08;H05K3/00;H05K3/12;H05K3/18;(IPC1-7):G03F1/08 主分类号 G03F1/08
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