| 摘要 |
<p>PURPOSE:To provide the phase shift mask which can prevent a shifter from being degraded and can normally maintain the phase shift function. CONSTITUTION:A light shielding pattern 3 to shield light and a shifted 4 composed of polymethyl methacrylate for shifting the phase of light at 180 deg. are provided on a transparent board 2, and a fluorine layer 5 is formed on the surface of this shifter 4. Thus, the abrasion of polymethyl methacrylate can be prevented and therefore, the shifter 4 is prevented from being degraded so as to normally maintain the phase shift function.</p> |
