| 发明名称 |
METHOD OF TREATING ELECTRON BEAM RESIST |
| 摘要 |
A process for producing a resist pattern by dry development using a resist comprising from 70 to 50% by weight of a novolac resin and from 30 to 50% by weight of a poly(ether pentene sulfone). |
| 申请公布号 |
JPS60102735(A) |
申请公布日期 |
1985.06.06 |
| 申请号 |
JP19840096709 |
申请日期 |
1984.05.16 |
| 申请人 |
INTERN BUSINESS MACHINES CORP |
发明人 |
REON EICHI KAPURAN;RICHIYAADO DEIIN KAPURAN |
| 分类号 |
H01L21/027;G03F7/038;G03F7/30;G03F7/36 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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