| 摘要 |
PURPOSE:To protect a substrate from scratches and to easily allow a heat to float at low height by uniformly dispersing fine crystalline particles on a disk substrate and etching the substrate to provide uniform and regular rugged patterns on the surface. CONSTITUTION:After the surface of a glass or aluminum substrate is polished, fine crystalline particles are uniformly dispersed to make contact areas of the particles on the surface. Then the substrate is etched with an etching agent in a vapor or liquid phase to provide fine, uniform and regular rugged patterns on its surface. The depth and intervals in the fine rugged pattern can be controlled by varying the composition of the substrate, dispersion state of the fine crystalline particles, selection of etching agent or its concentration, etc. Thereby, process control and quality control for production of the substrate can be performed easily, which is optimum for massproduction.
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