发明名称 NEGATIVE PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To enable lithography with high resolving power by exposing a negative photosensitive composition using light of wavelength in a deep UV range. CONSTITUTION:A negative photosensitive composition containing an alkali soluble resin, a compound expressed by the following formula [I] for use as a photoxidizer and a cross linking agent for the alkali soluble resin. R<1>-COO-R<2> [I] (In the formula R<1> and R<2> both represent alkyl groups, alkenyl groups or aromatic residual groups that may have substituents independently of each other; at least either of R<1> and R<2> is substituted by halogen atom and R<1> and R<2> are substituted by more than two halogen atoms as a whole.)
申请公布号 JPH04219755(A) 申请公布日期 1992.08.10
申请号 JP19900404434 申请日期 1990.12.20
申请人 MITSUBISHI KASEI CORP 发明人 OCHIAI TAMEICHI;TAKAHASHI NORIAKI;ISHIGURO TOMOYO
分类号 G03F7/004;G03F7/038;H01L21/027 主分类号 G03F7/004
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