发明名称 |
NEGATIVE PHOTOSENSITIVE COMPOSITION |
摘要 |
PURPOSE:To enable lithography with high resolving power by exposing a negative photosensitive composition using light of wavelength in a deep UV range. CONSTITUTION:A negative photosensitive composition containing an alkali soluble resin, a compound expressed by the following formula [I] for use as a photoxidizer and a cross linking agent for the alkali soluble resin. R<1>-COO-R<2> [I] (In the formula R<1> and R<2> both represent alkyl groups, alkenyl groups or aromatic residual groups that may have substituents independently of each other; at least either of R<1> and R<2> is substituted by halogen atom and R<1> and R<2> are substituted by more than two halogen atoms as a whole.) |
申请公布号 |
JPH04219755(A) |
申请公布日期 |
1992.08.10 |
申请号 |
JP19900404434 |
申请日期 |
1990.12.20 |
申请人 |
MITSUBISHI KASEI CORP |
发明人 |
OCHIAI TAMEICHI;TAKAHASHI NORIAKI;ISHIGURO TOMOYO |
分类号 |
G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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