发明名称 VACUUM PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To eliminate existing inconvenience such as decrease in laser output and make laser heating possible. SOLUTION: The vacuum processing device is used for vapor deposition while heating a substrate in a vacuum chamber having an optically transparent window in a part thereof. In the vacuum processing device, a holding section for holding the substrate and the optically transparent window are connected in a linear interspace, which is isolated from other places of the chamber. A laser oscillator is arranged outside the optically transparent window and irradiates a laser beam to the substrate through the linear interspace to heat the substrate. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008025017(A) 申请公布日期 2008.02.07
申请号 JP20060202634 申请日期 2006.07.25
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE;UNIV OF TOKYO 发明人 SUMIYA MASATOMO;MIKK-LIPPMAA;ONISHI TAKESHI;FUJIMOTO EIJI;KOINUMA HIDEOMI
分类号 C23C16/48 主分类号 C23C16/48
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