EXPOSURE SYSTEM AND CONTROL METHOD THEREOF

摘要

An exposing apparatus and a controlling method thereof are provided to reduce a producing cost by decreasing a scan time and a scan distance. An exposing apparatus(1) includes a platform(10) supported by a support frame(20) extended to a down direction of four edges. A stage(40) is movably installed in the platform in a longitudinal direction and the substrate is received in the upper part of the substrate. A driving unit(70) is installed in the upper part of the platform and moves the stage. A stage guide unit(30) is installed in the upper part of the platform and guides the moving direction of the stage. A plurality of gate structures(50a,50b) are movably received in a moving rail(230) of a separation distance controller(200). A plurality of optical module combination assemblies(100a,100b) are installed in one side of a plurality of gate structures for irradiating the substrate pattern light received in the stage.