发明名称 |
Method for producing electrically conductive indium oxide patterns on an insulating support by etching with hydrochloric acid and ferric chloride |
摘要 |
Etching indium patterns on insulating supports with the use of an etchant-resistant mask, by means of a solution of an acid to which ferric chloride has been added. Passivation of the bath is prevented by adding ferric chloride.
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申请公布号 |
US4093504(A) |
申请公布日期 |
1978.06.06 |
申请号 |
US19760712040 |
申请日期 |
1976.08.05 |
申请人 |
U.S. PHILIPS CORPORATION |
发明人 |
PONJEE, JOHANNES J.;FEIL, HENDRIK J. |
分类号 |
H01B13/00;G02F1/01;H01B5/14;H01L31/18;(IPC1-7):C23F1/02 |
主分类号 |
H01B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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