发明名称 Method for producing electrically conductive indium oxide patterns on an insulating support by etching with hydrochloric acid and ferric chloride
摘要 Etching indium patterns on insulating supports with the use of an etchant-resistant mask, by means of a solution of an acid to which ferric chloride has been added. Passivation of the bath is prevented by adding ferric chloride.
申请公布号 US4093504(A) 申请公布日期 1978.06.06
申请号 US19760712040 申请日期 1976.08.05
申请人 U.S. PHILIPS CORPORATION 发明人 PONJEE, JOHANNES J.;FEIL, HENDRIK J.
分类号 H01B13/00;G02F1/01;H01B5/14;H01L31/18;(IPC1-7):C23F1/02 主分类号 H01B13/00
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