| 摘要 |
1360217 Photoresist compositions EASTMAN KODAK CO 15 July 1971 [17 July 1970 (2) 29 Jan 1971] 33199/71 Heading C3P [Also in Divisions G2 and B6] Photosensitive compositions comprise a solution of a radiation-sensitive polymer and a polar N-halo cyclic imide. The imide improves adhesion of the composition to a substrate. The polymer may be inherently radiation-sensitive or may have a sensitizer added thereto. The compositions may also contain an organoalkoxysilane free of halogen, epoxy or amine groups. Exemplified compositions are formed from (1) cyclized polyisoprene, 2,6-di-(41-azidobenzol)-4- methyl cyclohexanone, xylene and either N- bromo- or N-chloro-succinimide or N-iodoglutarimide, and in one case additionallyγ- methacryloxypropyltrimethoxysilane, and (2) polyvinyl cinnamate (prepared by esterifying polyvinyl aclohol), hydroquinone, 1,2-benzanthraquinone, benzoic acid, xylene, methylglycol acetate and N-bromo-phthalimide. |
