发明名称 CLEANING METHOD FOR THERMAL HEAD
摘要 PURPOSE:To remove foreign matter accumulated on a thermal head through a simple operation and without damaging the thermal head, by a method wherein a sheet comprising a lubricant layer having a specified melting point or a lubricant-containing layer on a plastic film is fed while heating the head before conducting thermal recording by using an ink ribbon. CONSTITUTION:A plastic film used as a base may be a film of polyethylene terephthalate, polypropylene, an acrylic resin or the like, the thickness of which is ordinarily about 6-25mum. A lubricant provided on the base is at least one wax, surfactant or the like. A paraffin wax, an oxidized was, an ester wax or the like may be used as the wax, while a nonionic surfactant, an anionic surfactant, a cationic surfactant or the like may be used as a surfactant. The lubricant has a melting point of 50-100 deg.C, and is used in an amount of 0.002-0.5g/m<2>, regardless of the presence or absence of a solvent-supporting layer.
申请公布号 JPS6277972(A) 申请公布日期 1987.04.10
申请号 JP19850218554 申请日期 1985.09.30
申请人 NITTO ELECTRIC IND CO LTD 发明人 MATSUOKA NAOKI;OSHIMA TOSHIYUKI;USHIRO HIROYUKI;IJICHI ICHIRO;NAGATSUKA TATSUKI
分类号 B41J29/17 主分类号 B41J29/17
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