发明名称 PROCESSING SOLUTION TANK
摘要 PURPOSE: A liquid treatment tank which has a minimized opening area of a workpiece path is provided to maintain the sealability of the workpiece path by rapidly closing the workpiece path. CONSTITUTION: A liquid treatment tank comprises a gate apparatus(85) of a workpiece path(88). The workpiece path comprises an opening(88b) and an expended opening(88a). The opening is slit type. The gate apparatus is composed of a gate member and a shutter plate. The gate member opens and closes the opening. The shutter plate opens and closes the expended opening.
申请公布号 KR20100047161(A) 申请公布日期 2010.05.07
申请号 KR20090102250 申请日期 2009.10.27
申请人 C. UYEMURA & CO., LTD. 发明人 NAKAGAWA YOSHIMI;NARADA TADAAKI
分类号 C25D17/00;C25D17/08 主分类号 C25D17/00
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