| 摘要 |
PURPOSE: To completely remove the oxygen atom and carbon atom adsorbed on a substrate at a low temp. by dissociating gaseous hydrogen introduced into a vacuum vessel into the atom and irradiating the substrate with the atom. CONSTITUTION: Gaseous H2 6 is introduced into a vacuum vessel 2 in which a germanium substrate 1 is arranged, and the vessel is evacuated to about 1×10<-4> Torr by a vacuum pump 3. A filament 4 is heated to about 1800 deg.C by a power source 5. The gaseous H2 6 is brought into contact with the high-temp. filament 4, and the substrate 1 is irradiated with the formed atomic hydrogen. In this case, the substrate 1 is kept at <=400 deg.C, and the dose of the atomic hydrogen is preferably controlled to >=3000 Langmuir. As a result, the germanium substrate is not roughened, the adsorbed oxygen atom and carbon atom are effectively removed, and the substrate is cleaned.
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