摘要 |
PURPOSE: To provide a drawing apparatus in which a bad beam is surely eliminated.CONSTITUTION: A multi-charged particle beam drawing apparatus includes: an aperture member for forming a multi-beam when some charged particle beams pass through a plurality of apertures, respectively; a plurality of first blankers for performing blanking deflection of corresponding beams respectively, out of the multi-beam passed through the plurality of apertures of the aperture member; a plurality of second blankers for deflecting a bad beam, out of the multi-beam passed through the plurality of apertures of the aperture member, in a direction orthogonal to a deflection direction of the plurality of first blankers; a blanking aperture member for shielding each beam deflected so as to be a beam off state by at least one of the plurality of first blankers and the plurality of second blankers; and a detection unit for detecting the bad beam, out of the multi-beam passed through the plurality of apertures of the aperture member.SELECTED DRAWING: Figure 1 |