发明名称 MULTI-CHARGED PARTICLE BEAM DRAWING METHOD
摘要 PURPOSE: To provide a drawing apparatus in which a bad beam is surely eliminated.CONSTITUTION: A multi-charged particle beam drawing apparatus includes: an aperture member for forming a multi-beam when some charged particle beams pass through a plurality of apertures, respectively; a plurality of first blankers for performing blanking deflection of corresponding beams respectively, out of the multi-beam passed through the plurality of apertures of the aperture member; a plurality of second blankers for deflecting a bad beam, out of the multi-beam passed through the plurality of apertures of the aperture member, in a direction orthogonal to a deflection direction of the plurality of first blankers; a blanking aperture member for shielding each beam deflected so as to be a beam off state by at least one of the plurality of first blankers and the plurality of second blankers; and a detection unit for detecting the bad beam, out of the multi-beam passed through the plurality of apertures of the aperture member.SELECTED DRAWING: Figure 1
申请公布号 JP2016115946(A) 申请公布日期 2016.06.23
申请号 JP20160028702 申请日期 2016.02.18
申请人 NUFLARE TECHNOLOGY INC 发明人 MATSUMOTO YASUSHI
分类号 H01L21/027;G03F7/20;H01J37/305 主分类号 H01L21/027
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