| 摘要 |
PURPOSE:To obtain a phase shift mask and its production to decrease defects in the mask and to easily repair the mask. CONSTITUTION:The phase shift mask consists of a mask pattern 2 formed on a mask pattern substrate 7 and a shifter pattern 3 formed on a shift pattern substrate 8. These two substrates are disposed in a manner that the pattern surface of the face mask pattern 2 and the pattern surface of the shifter pattern 3 face to each other with a specified pattern distance 11. These substrates are aligned in a manner that the mask pattern 2 and the shifter pattern 3 overlap in a specified amt. for the irradiation light and held in one body to constitute the mask. |
