| 发明名称 |
PROCESS OF VACUUM-PLASMA DEPOSITION OF COATS |
| 摘要 |
FIELD: electronics, optics. SUBSTANCE: process includes deposition of coat in inert gas with the use of system made of treated part and screen in the form of grid. Deposition is combined with ion bombardment of substrate under pressure of inert gas equal to 10-2-10-1 Pa. EFFECT: deposition of coats with nanocrystalline structure. 1 dwg
|
| 申请公布号 |
RU2145362(C1) |
申请公布日期 |
2000.02.10 |
| 申请号 |
RU19970116891 |
申请日期 |
1997.10.16 |
| 申请人 |
UFIMSKIJ GOSUDARSTVENNYJ AVIATSIONNYJ TEKHNICHESKI;UNI J |
发明人 |
BUDILOV V.V.;SHEKHTMAN S.R.;KIREEV R.M. |
| 分类号 |
C23C14/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
