| 摘要 |
PURPOSE:To enable a wafer to be given with uniform polishing ability by employing porous material as an attraction face and impregnating the annular outer peripheral section of an attraction face with a soft elastic body for sealing in attraction. CONSTITUTION:When an automatic valve 9 is opened, an automatic valve 10 is closed, and vacuum sources 5 and 7 are actuated, a porous material 1 and annular section channel 6 become decompression state attracting a wafer 11. The wafer 11 is attracted in the hole section 6 of an annular member 2 made of porous material impregnated with a soft elastic body to be firmly stuck with the soft body. When the automatic valve 9 is closed, and the automatic valve 10 is opened after machining, vacuum sections 5 and 7 are stopped, and a pressured water source 8 is actuated, a pressured water gushes from the channel section 6 to the wafer 11 removing the 11 from the porous material 1 and completing machining. |
