| 摘要 |
PURPOSE: A liquid delivery system of chemical vapor deposition equipment is provided to uniformly control quantity, speed and pressure of source flowing according to time irrespective of the quantity of the source inside a source tank. CONSTITUTION: In a liquid delivery system for receiving liquid source(4) to supply source into a reactor, the liquid delivery system comprises a liquid receiving container(2) which is surrounded by wall, and on the upper part of which an outlet(15) for discharging liquid source is formed; a boundary member for dividing the inside of the liquid receiving container into first space into which liquid source is received and second space; and a means for reducing volume of the first space, wherein the means for reducing the volume of the first space is a straight line transfer appliance for transferring the boundary member to the outlet(15) side, wherein a hole for connecting the second space to the outer part of the receiving container is formed on the receiving container, and the means for reducing the volume of the first space is a fluid supply device connected to the second space through the hole, and wherein the apparatus further comprises a bellows(5) which is positioned in the second space of the receiving container, the upper end of which is adhered to the boundary member, and the outer wall of which is adhered to a wall positioned at the lower side of the boundary member, a passageway for connecting the inner side of the bellows to the outer part of the receiving container is formed on the receiving container, and the means for reducing the volume of the first space is a fluid supply device connected to the inner side of the bellows through the passageway.
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