| 摘要 |
PURPOSE: A substrate processing apparatus is provided to prevent the recontamination of substrate and to improve the yield of product by inducing the fume and the micro particle within the chamber to the exhaust pipe. CONSTITUTION: A substrate is processed in a chamber(110). An exhaust pipe(170) locates outside the chamber. One end of the exhaust pipe is combined in the sidewall of the chamber. The exhaust pipe exhausts the fume and the micro particle in the chamber to the outside. The first fan is installed in the input end of the exhaust pipe. The first fan induces the air current in the chamber to flow to the exhaust pipe. The first fan locates in the chamber.
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