发明名称 METHOD AND DEVICE FOR ELECTRON BEAM IRRADIATION
摘要 PROBLEM TO BE SOLVED: To make uniform the dose of an electron beam in each spot in the irradiating direction by irradiating an object with an electron beam emitted from a concavely formed section of an irradiation window in the state of the object being placed in a concavely formed space where a electron beam is scanned. SOLUTION: A electron beam 8 is scanned by a magnet 5 that generates an alternating field in a base of an electron beam horn 6. The alternating field is controlled so as to make the scanning waveform a triangular-waveform. After the electron beam 8 is deflected toward the center side in accordance with a deflection angle by deflection magnet plates 19A and 19B, the beam 8 is emitted from an radiation window 7 concaved in a U-shape into the air. An object 20 that is intruded by a mesh conveyer 14 into the u-shaped concave radiation window 7 is irradiated with uniform energy as far as to a bottle body 25. Moreover, a both bottom which hardly transmit the electron beam is irradiated with electron beam 18 reflected of the scanning electron beam 8 from a reflector 12. Thereby almost uniform dose in given in every spot of the object 20.
申请公布号 JPH11248892(A) 申请公布日期 1999.09.17
申请号 JP19980064814 申请日期 1998.02.27
申请人 MITSUBISHI HEAVY IND LTD 发明人 KISHIGAMI TOSHIO;YAMAKAWA TAKASHI
分类号 G21K1/093;A61L2/08;G21K5/00;G21K5/04;H01J37/317 主分类号 G21K1/093
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