发明名称 |
METHOD AND DEVICE FOR ELECTRON BEAM IRRADIATION |
摘要 |
PROBLEM TO BE SOLVED: To make uniform the dose of an electron beam in each spot in the irradiating direction by irradiating an object with an electron beam emitted from a concavely formed section of an irradiation window in the state of the object being placed in a concavely formed space where a electron beam is scanned. SOLUTION: A electron beam 8 is scanned by a magnet 5 that generates an alternating field in a base of an electron beam horn 6. The alternating field is controlled so as to make the scanning waveform a triangular-waveform. After the electron beam 8 is deflected toward the center side in accordance with a deflection angle by deflection magnet plates 19A and 19B, the beam 8 is emitted from an radiation window 7 concaved in a U-shape into the air. An object 20 that is intruded by a mesh conveyer 14 into the u-shaped concave radiation window 7 is irradiated with uniform energy as far as to a bottle body 25. Moreover, a both bottom which hardly transmit the electron beam is irradiated with electron beam 18 reflected of the scanning electron beam 8 from a reflector 12. Thereby almost uniform dose in given in every spot of the object 20. |
申请公布号 |
JPH11248892(A) |
申请公布日期 |
1999.09.17 |
申请号 |
JP19980064814 |
申请日期 |
1998.02.27 |
申请人 |
MITSUBISHI HEAVY IND LTD |
发明人 |
KISHIGAMI TOSHIO;YAMAKAWA TAKASHI |
分类号 |
G21K1/093;A61L2/08;G21K5/00;G21K5/04;H01J37/317 |
主分类号 |
G21K1/093 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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