发明名称 Surface acoustic wave device
摘要 A surface acoustic wave device has a high electromechanical coefficient and reflection coefficient, and also has an improved frequency-temperature characteristic that is achieved by forming a SiO<SUB>2 </SUB>film on an IDT so as to prevent cracking from occurring on a surface of the SiO<SUB>2 </SUB>film so that desired properties can be reliably obtained. The surface acoustic wave device includes at least one IDT, which is composed of a metal or an alloy having a density higher than that of Al and is formed on a 25° to 55° rotation-Y plate X propagation LiTaO<SUB>3 </SUB>substrate, and a SiO<SUB>2 </SUB>film disposed on the LiTaO<SUB>3 </SUB>substrate so as to cover the at least one IDT for improving the frequency-temperature characteristic.
申请公布号 US7034433(B2) 申请公布日期 2006.04.25
申请号 US20020270207 申请日期 2002.10.12
申请人 MURATA MANUFACTURING CO., LTD. 发明人 KADOTA MICHIO;NAKAO TAKESHI;MIMURA MASAKAZU
分类号 H01L41/08;H01L41/09;H01L41/18;H01L41/22;H03H3/08;H03H9/02;H03H9/145;H03H9/25 主分类号 H01L41/08
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