发明名称 CYLINDRICAL TARGET AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To extend the possibility of material selection for a target material and a backing tube supporting it in a cylindrical target to be used for a magnetron sputtering system, to simplify its manufacture and to attain its recycling. SOLUTION: The cylindrical target 14 can be obtained by joining a backing tube 16 made of metal as an internal cylinder and a cylindrical target material 20 as an external cylinder by interposing a shock-absorbing member 52 such as a carbon felt between them.
申请公布号 JP2002155356(A) 申请公布日期 2002.05.31
申请号 JP20010268437 申请日期 2001.09.05
申请人 ASAHI GLASS CO LTD 发明人 UEDA HIROSHI;KAMIYAMA TOSHIHISA;KANDA KOICHI
分类号 C23C14/34;(IPC1-7):C23C14/34 主分类号 C23C14/34
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