发明名称 |
CYLINDRICAL TARGET AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To extend the possibility of material selection for a target material and a backing tube supporting it in a cylindrical target to be used for a magnetron sputtering system, to simplify its manufacture and to attain its recycling. SOLUTION: The cylindrical target 14 can be obtained by joining a backing tube 16 made of metal as an internal cylinder and a cylindrical target material 20 as an external cylinder by interposing a shock-absorbing member 52 such as a carbon felt between them.
|
申请公布号 |
JP2002155356(A) |
申请公布日期 |
2002.05.31 |
申请号 |
JP20010268437 |
申请日期 |
2001.09.05 |
申请人 |
ASAHI GLASS CO LTD |
发明人 |
UEDA HIROSHI;KAMIYAMA TOSHIHISA;KANDA KOICHI |
分类号 |
C23C14/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|