发明名称 METHOD AND DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method and device for manufacturing a semiconductor device, wherein the power consumption of a dry pump is reduced for lower running cost related to a semiconductor manufacturing device comprising a plurality of vacuum reaction vessels and vacuum exhaust devices. SOLUTION: In processing a semiconductor substrate, a vacuum exhausting pump, especially dry pumps 31, 32, and 33, for a vacuum reaction vessel which requires no continuous vacuum exhausting is stopped appropriately. Stopping of pump driving reduces power consumption for lowering the running cost. After a wafer cassette has been set at a cassette chamber 11 for pre-exhausting by the dry pump 31 connected to the cassette chamber, a semiconductor wafer is transported by a transportation robot, and here a transportation robot chamber 13 is also required to be kept at a reduced pressure, so that exhausting is continued by the dry pump 32 connected to the transportation robot chamber.
申请公布号 JPH11204508(A) 申请公布日期 1999.07.30
申请号 JP19980014926 申请日期 1998.01.09
申请人 TOSHIBA CORP 发明人 NARITA MASAKI;OKUMURA KATSUYA;HATTORI KEI;YOSHIDA YUKIMASA
分类号 B01J3/02;C23C14/56;C23C16/44;C23C16/54;H01L21/00;H01L21/02;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;H01L21/677;(IPC1-7):H01L21/306;H01L21/68 主分类号 B01J3/02
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