Method of manufacturing hollow-structure metal grating

摘要

A method for making a hollow-structure metal grating is provided. The method includes the following steps. First, a substrate is provided. Second, a metal layer is located on a surface of the substrate. Third, a patterned mask layer is formed on a surface of the metal layer. The patterned mask layer is made of a chemical amplified photoresist. Fourth, the surface of the metal layer exposed out of the patterned mask layer is plasma etched. Lastly, the patterned mask layer on the surface of the metal layer is dissolved.

主权项

1. A method of manufacturing a hollow-structure metal grating, the method comprising:
S10, providing a substrate having a top surface; S20, applying a metal layer on the top surface of the substrate, wherein the whole metal layer is directly attached to the top surface of the substrate; S30, forming a patterned mask layer on a surface of the metal layer, wherein the patterned mask layer is made of a chemical amplified photoresist; S40, plasma etching part of the surface of the metal layer exposed out of the patterned mask layer; and S50, dissolving the patterned mask layer on the surface of the metal layer.