| 摘要 |
<p>PURPOSE: To obtain a practically useful pellicle excellent in resistance to an air blow and light by using a polymer obtained by polymerizing a monomer contg. a norbornane derivative as a pellicle material. CONSTITUTION: A polymer obtained by polymerizing a monomer contg. a norbornane derivative is used as a pellicle material. The polymer is inexpensive as compared with an amorphous fluoric polymer and highly resistant to an air blow, and the film is not extended or broken up to 3.0kgf gas pressure. Since the light transmittance and light resistance are also excellent, the pellicle is utilizable in the lithography process with an exposure light source of >=350nm wavelength and appropriately used in a large-sized pellicle such as the batch exposure of a liq. crystal. Further the light transmittance and light resistance are remarkably increased when the hydrogenation ratio of this polymer consisting of a norbornane derivative is controlled to >=99.0%.</p> |
