Substrates heat treatment apparatus

摘要

In apparatus for treating substrates (A), consisting of a vacuum chamber containing a vertically rotatable holder (1) for (A), a vacuum air-lock for introducing and removing (A) and a handling system for transporting (A) and charging or discharging the holder, the holder (specifically in cup form) includes segments (3) around the rotational axis and is tiltable about an axis perpendicular to the rotational axis.