发明名称 X-RAY DIFFRACTION APPARATUS AND X-RAY DIFFRACTING AND MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To obtain an X-ray diffraction apparatus capable of performing X-ray diffraction and measurement with respect to both of a sample large in crystal grain and a sample small in crystal grain under a proper condition. SOLUTION: An X-ray element support apparatus 11 can support a Solar slit 12 forming a parallel X-ray beam and a collimator forming a fine caliber X-ray beam in a replaceable manner. An X-ray detector 21 can selectively realize a position resolving function measuring the intensity of X-rays taken in linearly by CCD detector 9 at every position of the linear range of X-rays and an intensity averaging function averaging the intensities of linearly taken-in Xrays in the whole or a part of the linear range of X-rays to measure them as one intensity of X-rays. By selecting the solar slit 12 and the collimator and selecting the function of the X-ray detector 21, X-ray diffraction and measurement can be performed under a proper condition regardless of the size of a crystal grain.
申请公布号 JP2000180388(A) 申请公布日期 2000.06.30
申请号 JP19980360284 申请日期 1998.12.18
申请人 RIGAKU CORP 发明人 OGISO KATSUHIKO
分类号 G01N23/20;G21K1/06;(IPC1-7):G01N23/20 主分类号 G01N23/20
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