| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrode plate, for a plasma etching operation, by which carbon particles which fall onto the surface of a wafer adhere thereto are small in the etching operation, by which the etching operation is performed stably and by which an electrode can be used for many hours. SOLUTION: In an electrode plate for a plasma etching operation, glasslike carbon whose raw material is a mixture of a liquid phenolic resin and a powdery phenolic resin having a number average molecular weight of 250 to 350 and having a viscosity at 25 deg.C of 100 to 350 centipoises is used as a basic material. |
