发明名称 |
Film or coating deposition and powder formation |
摘要 |
Methods for depositing a material onto a substrate include the steps of: feeding a material solution including one or more precursor compounds, a solvent and a pH-modifying catalyst to an outlet to provide a stream of droplets of the material solution; generating an electric field to electrostatically attract the droplets from the outlet towards the substrate; and providing an increase in temperature between the outlet and the substrate. |
申请公布号 |
US6331330(B1) |
申请公布日期 |
2001.12.18 |
申请号 |
US19980091456 |
申请日期 |
1998.06.15 |
申请人 |
IMPERIAL COLLEGE OF SCIENCE, TECHNOLOGY, AND MEDICINE |
发明人 |
CHOY KWANG-LEONG;BAI WEI |
分类号 |
B05D1/04;C03B19/12;C03B19/14;C03C17/23;C03C17/25;C03C17/32;C04B41/45;C04B41/81;C23C16/40;C23C16/44;C23C16/448;C23C18/12;C30B7/00;(IPC1-7):B05D1/04 |
主分类号 |
B05D1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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