发明名称 Film or coating deposition and powder formation
摘要 Methods for depositing a material onto a substrate include the steps of: feeding a material solution including one or more precursor compounds, a solvent and a pH-modifying catalyst to an outlet to provide a stream of droplets of the material solution; generating an electric field to electrostatically attract the droplets from the outlet towards the substrate; and providing an increase in temperature between the outlet and the substrate.
申请公布号 US6331330(B1) 申请公布日期 2001.12.18
申请号 US19980091456 申请日期 1998.06.15
申请人 IMPERIAL COLLEGE OF SCIENCE, TECHNOLOGY, AND MEDICINE 发明人 CHOY KWANG-LEONG;BAI WEI
分类号 B05D1/04;C03B19/12;C03B19/14;C03C17/23;C03C17/25;C03C17/32;C04B41/45;C04B41/81;C23C16/40;C23C16/44;C23C16/448;C23C18/12;C30B7/00;(IPC1-7):B05D1/04 主分类号 B05D1/04
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