发明名称 Copper interconnect for semiconductor device
摘要 An improved wire bond is provided with the bond pads of semiconductor devices and the lead fingers of lead frames or an improved conductive lead of a TAB tape bond with the bond pad of a semiconductor device. More specifically, an improved wire bond is described wherein the bond pad on a surface of the semiconductor device comprises a layer of copper and at least one layer of metal and/or at least a barrier layer of material between the copper layer and one layer of metal on the copper layer to form a bond pad.
申请公布号 US7345358(B2) 申请公布日期 2008.03.18
申请号 US20050266836 申请日期 2005.11.04
申请人 MICRON TECHNOLOGY, INC. 发明人 AKRAM SALMAN
分类号 H01L23/48;H01L21/60;H01L23/485;H01L23/495 主分类号 H01L23/48
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