POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN FROM THE SAME

摘要

A positive resist composition comprising (A) a resin ingredient which has ester side chains having an acid-dissociating dissolution-inhibitive group containing a polycyclic group and has structural units derived from a (meth)acrylic ester in the main chain and which comes to have enhanced alkali solubility by the action of an acid, (B) an acid generator ingredient which generates an acid upon exposure to light, and (C) an organic solvent, the composition being of the chemical amplification type wherein the ingredient (A) has both structural units derived from a (meth) acrylic ester and structural units derived from an acrylic ester. This resist composition gives a resist pattern which is reduced in surface roughness and line edge roughness during etching and has excellent resolution and a wide focal-depth range.