发明名称 |
Method for crystallizing amorphous silicon into polysilicon and mask used therefor |
摘要 |
A mask for laser-crystallizing amorphous silicon into polysilicon is provided. The mask comprises a transparent substrate having a first block, a second block, and a third block with equal sizes. The second block is located between the first block and the third block. The first block includes a plurality of first transmission regions and a plurality of first opaque regions located between the first transmission regions. The second block includes a plurality of second transmission regions correspond to the first opaque regions and a plurality of second opaque regions located between the second transmission regions and corresponds to the first transmission regions. The third block includes a plurality of third transmission regions arranged corresponding to the centers of the first transmission regions and corresponding to centers of the second transmission regions and a plurality of third opaque regions located between the third transmission regions.
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申请公布号 |
US7579123(B2) |
申请公布日期 |
2009.08.25 |
申请号 |
US20060557947 |
申请日期 |
2006.11.08 |
申请人 |
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
CHU FANG-TSUN;CHEN YU-CHENG |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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