发明名称 GAP SETTING MECHANISM AND APPARATUS AND METHOD FOR ANALYZING SAMPLE USING THE MECHANISM
摘要 <p>PROBLEM TO BE SOLVED: To absorb evanescent wave generated by totally reflecting a measurement light in a prism to the surface of a sample by making it possible to infinitesimally set the interval between the prism and the sample. SOLUTION: A prism 31 is sucked and held on the upper surface of a holding member 24, checked by a measuring sensor 66, and if required, the upper surface is corrected to become a flat under the control of a correction driver. Then, the parallelism and displacement amount between the sample holding surface 41a and the upper surface of the prism 31 are set by a controller. A semiconductor wafer U is mounted on the surface 41a with the front surface placed at the down side, a plurality of suction pumps are sequentially operated in the plurality of annular grooves of a board-like body 41 and sucked and held without generating the slack at the wafer U. In this case, the applied voltage to a piezoelectric element 18 is regulated so as to become predetermined 0.3μm while monitoring the gap between the surface 41a and the upper surface of the prism 31 by a gap sensor 71, an infrared ray is passed from a light source 37 to the prism 31, an evanescent wave is penetrated to the wafer U from the totally reflecting part and absorbed in response to the component of the substance of the part.</p>
申请公布号 JPH09257700(A) 申请公布日期 1997.10.03
申请号 JP19960063257 申请日期 1996.03.19
申请人 TOSHIBA CORP 发明人 IGARASHI KENJI
分类号 G01N21/01;G01N21/27;G01N21/35;G01N21/3563;G01N21/552;(IPC1-7):G01N21/27 主分类号 G01N21/01
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