| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus, capable of preventing deviation in position of a substrate in a vacuum chamber and a trouble during carriage. SOLUTION: In a vacuum treatment apparatus, a thin-plate substrate 4 is mounted on an electrode 3 as a mounting part in a vacuum chamber 6. The inside of the vacuum chamber 6 is put in a vacuum, and the substrate 4 is treated under low-pressure atmosphere. The electrode 3 has a plurality of air discharging grooves 3a arranged linearly and continuously in a substrate carrying direction on its upper face to discharge air between the lower face of the substrate 4 and the electrode 3. Then, the dislocation of the substrate 4 caused by a difference in pressure between the upper and lower faces of the substrate 4 during vacuum exhausting can be prevented. In addition, a plurality of carrying nails can be provided, so that the carrying nails do not come out of the edge of the substrate 4 during carriage, and the substrate 4 is carried steadily.</p> |
