| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition having a high transmission factor and a small sublimation property against KRF light, stable under the existence of trace base, having high resolution and high sensitivity, and capable of controlling line width with good accuracy by containing a specific radiation-sensitive acid forming agent and an alkali-insoluble or alkali- slightly soluble resin having an acid dissociation protective group and becoming alkali-soluble when the acid dissociation protective group is dissociated. SOLUTION: This positive radiation-sensitive resin composition contains a radiation-sensitive acid forming agent expressed by a formula I and an alkali- insoluble or alkali-slightly soluble resin having an acid dissociation protective group and becoming alkali-soluble when the acid dissociation protective group is dissociated. In the formula I, R<1> and R<2> are a monovalent organic group, and one of them has ester bond (-COO-) or an alcoholic hydroxyl group. This resin contains a repeating unit expressed by a formula II or III, where R<3> -R<5> indicate a hydrogen atom or a methyl group, R<6> indicates a straight chain or branch alkyl group having carbon atoms of 1-4, and R<7> indicates a straight chain or branch alkyl group having carbon atoms of 1-6 or a cyclic alkyl group having carbon atoms of 5-8. |
