| 摘要 |
PROBLEM TO BE SOLVED: To provide a high speed pattern exposure device and at the same time obtain a stable exposure quality. SOLUTION: A pattern exposure device consists of a light source 31, a pattern-generating device 51, and a projection lens 91. In this case, a plurality of flash lamps 32 are used for the light source 31, at the same time one segment is formed by light emitted from one flash lamp, and a pattern-generating device 51 is constituted by arranging a plurality of segments. |
