| 摘要 |
PURPOSE:To form a uniform thin film on the surface of a columnar substrate at a high rate by arranging a couple of microwave transmitting conductors to be confronted with the outer periphery of the substrate when the substrate is placed in a vacuum chamber, raw gas is supplied, and a thin film is formed on the substrate by the excitation and decomposition of the raw gas by a microwave. CONSTITUTION:The substrate 2 having a three-dimensional shape such as a column is placed in the vacuum chamber 1, and a couple of conductors 5 and 5' are arranged in the immediate proximity of the substrate 2 and connected to a microwave oscillator 3 through a microwave transmission line 4. The raw gas contg. an Si compd. such as SiH4 is supplied into the vacuum chamber 1 from a gas inlet 6, the substrate 2 is heated by a heater 8, and a microwave is supplied to the conductors 5 and 5' from the microwave oscillator 3 through the line 4. Consequently, a strong electric field is formed between the conductors 5 and 5', hence the raw gas in the vacuum chamber 1 is excited and decomposed to produce the plasma, a uniform thin amorphous Si film is formed on the substrate, and an electrophotographic sensitive body is obtained at a low cost. |
