发明名称 VACUUM CHUCK APPARATUS OF SEMICONDUCTOR FABRICATION EQUIPMENT
摘要 PURPOSE: A vacuum adsorption unit in a semiconductor manufacturing equipment is provided to sense correctly an adsorbing state of an object by using a digital vacuum sensor for sensing a state of adsorption of a wafer or a reticle. CONSTITUTION: A digital vacuum sensor(34) is installed at a vacuum line(32) for providing a vacuum state. The digital vacuum sensor(34) senses an adsorbing state of an object by utilizing an internal pressure of the vacuum line(32). A reference voltage stabilizing circuit(38) outputs a reference voltage of a predetermined level. A comparison portion(36) compares the reference voltage with a sensing signal of the digital vacuum sensor(34) and outputs a comparing signal about the adsorbing state.
申请公布号 KR100253092(B1) 申请公布日期 2000.06.01
申请号 KR19970066285 申请日期 1997.12.05
申请人 SAMSUNG ELECTRONICS CO.,LTD. 发明人 PARK, SOON JONG;LYU, KI MAN
分类号 B23Q3/08;B25J15/06;B65G49/07;H01L21/00;H01L21/027;H01L21/683;(IPC1-7):H01L21/027 主分类号 B23Q3/08
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