发明名称 |
VACUUM CHUCK APPARATUS OF SEMICONDUCTOR FABRICATION EQUIPMENT |
摘要 |
PURPOSE: A vacuum adsorption unit in a semiconductor manufacturing equipment is provided to sense correctly an adsorbing state of an object by using a digital vacuum sensor for sensing a state of adsorption of a wafer or a reticle. CONSTITUTION: A digital vacuum sensor(34) is installed at a vacuum line(32) for providing a vacuum state. The digital vacuum sensor(34) senses an adsorbing state of an object by utilizing an internal pressure of the vacuum line(32). A reference voltage stabilizing circuit(38) outputs a reference voltage of a predetermined level. A comparison portion(36) compares the reference voltage with a sensing signal of the digital vacuum sensor(34) and outputs a comparing signal about the adsorbing state. |
申请公布号 |
KR100253092(B1) |
申请公布日期 |
2000.06.01 |
申请号 |
KR19970066285 |
申请日期 |
1997.12.05 |
申请人 |
SAMSUNG ELECTRONICS CO.,LTD. |
发明人 |
PARK, SOON JONG;LYU, KI MAN |
分类号 |
B23Q3/08;B25J15/06;B65G49/07;H01L21/00;H01L21/027;H01L21/683;(IPC1-7):H01L21/027 |
主分类号 |
B23Q3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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