发明名称 高速で低温基板上の薄膜を硬化させるための方法および装置
摘要 PROBLEM TO BE SOLVED: To provide a method and apparatus for curing thin films on low-temperature substrates at high speeds.SOLUTION: A curing apparatus for thermally processing thin films on low-temperature substrates at high speeds is disclosed. The curing apparatus includes a strobe head, a strobe control module and a conveyor control module. The strobe control module controls the power, duration and repetition rate of a set of pulses generated by a flash lamp on the strobe head. The conveyor control module along with the strobe control module provide real-time synchronization between the repetition rate of the set of pulses and the speed at which the substrate is being moved under the strobe head, according to the speed information.SELECTED DRAWING: None
申请公布号 JP2016106398(A) 申请公布日期 2016.06.16
申请号 JP20150245119 申请日期 2015.12.16
申请人 エヌシーシー ナノ, エルエルシー 发明人 カート エー. シュローダー;カール エム. マーティン;ダグ ケー. ジャクソン;スティーブン シー. マックール
分类号 H01L21/26 主分类号 H01L21/26
代理机构 代理人
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