发明名称 HOLDER, OBJECT SUPPORT DEVICE AND EXPOSURE, AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To receive a wafer from a conveyance device in a less space.SOLUTION: A wafer support part 74b of a wafer support unit 125 is rotated around one axis and thereby a wafer W conveyed to below a chuck unit 153 by a conveyance loader 149 is supported from below. Thereafter, the underside of the wafer W is sucked and held via a suction part 78. After the wafer W is held together with the chuck unit 153, the wafer W is placed on a wafer stage. Therefore, the rotation of the wafer support part 74b around the one axis makes it possible to receive the wafer W in a small space.SELECTED DRAWING: Figure 6
申请公布号 JP2016122777(A) 申请公布日期 2016.07.07
申请号 JP20140262862 申请日期 2014.12.25
申请人 NIKON CORP 发明人 EDA TAKESHI
分类号 H01L21/677;G03F7/20;H01L21/027 主分类号 H01L21/677
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