发明名称 METHOD OF PROCESSING SINGLE-CRYSTAL SUBSTRATE
摘要 A method of dividing a single-crystal substrate along a plurality of preset division lines, includes a shield tunnel forming step of applying a pulsed laser beam having such a wavelength that permeates through the substrate along the division lines to form shield tunnels, each including a fine hole and an amorphous region shielding the fine hole, a protective member adhering step of adhering a protective member to the substrate before or after the shield tunnel forming step, and a grinding step of holding the protective member on the substrate, to which the shield tunnel forming step and the protective member adhering step are performed, on a chuck table of a grinding apparatus, grinding a reverse surface of the substrate to bring the substrate to a predetermined thickness, and dividing the substrate along the division lines along which the shield tunnels have been formed.
申请公布号 US2016268155(A1) 申请公布日期 2016.09.15
申请号 US201615068141 申请日期 2016.03.11
申请人 DISCO CORPORATION 发明人 Morikazu Hiroshi;Takeda Noboru;Shotokuji Takumi
分类号 H01L21/683;H01L21/78 主分类号 H01L21/683
代理机构 代理人
主权项 1. A method of processing a single-crystal substrate to divide the single-crystal substrate along a plurality of preset division lines, comprising: a shield tunnel forming step of applying a pulsed laser beam having such a wavelength that permeates through the single-crystal substrate to the single-crystal substrate along the division lines to form shield tunnels, each shield tunnel including a fine hole and an amorphous region shielding the fine hole, in the single-crystal substrate along the division lines; a protective member adhering step of adhering a protective member to the single-crystal substrate before or after the shield tunnel forming step; and a grinding step of holding the protective member on the single-crystal substrate, to which the shield tunnel forming step and the protective member adhering step are performed, on a chuck table of a grinding apparatus, grinding a reverse surface of the single-crystal substrate to bring the single-crystal substrate to a predetermined thickness, and dividing the single-crystal substrate along the division lines along which the shield tunnels have been formed.
地址 Tokyo JP