| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a light emitting device that removes debris appropriately, suppresses a decrease in the performance of an optical system, and generates EUV light stably, and to provide an aligner. <P>SOLUTION: The light emitting device for generating plasma by irradiating a target member placed in vacuum or pressure-reduced environment with laser beams, and taking out light radiated from the plasma comprises a laser introduction window for separating the vacuum or pressure-reduced environment and transmitting laser beams; and a prevention means that is arranged between the introduction window and the target member, and prevents debris generated from the target member from adhering to the laser introduction window. The prevention means comprises an absorption mechanism for sucking the debris and transmits or reflects the laser beams, a cutoff mechanism for passing the laser beams when the laser beams are emitted and shuts off the optical path of the laser beams in cases other than the emission of the laser beams, and a deflection means for changing the movement direction of the electrified debris. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
