EXPOSURE DEVICE

摘要

PURPOSE:To permit ready formation of a semiconductor integrated circuit having fine element dimensions by wave front splitting a luminous flux incident on a reticle surface with a grating and cutting a part of the split light with a space filter for projection in two-flux interference fringe. CONSTITUTION:A phase grating 41 is disposed on a reticle at a point of focus f1 of a Fourier transform lens 15 for diffracting a parallel luminous flux from a light source 11 into a plurality of diffracted luminous fluxes to be incident on the lens 15. Spectrum images 60-63 are formed on a focal plane, and only plus and minus first order diffracted light is passed through a space filter disposed at that position. The diffracted light is passed through a Fourier transform lens 17 for forming a reticle image on a wafer 18, while also making the two-flux interference fringe pitch further finder. It is thus possible to form a semiconductor integrated circuit pattern having fine element dimensions of the order of sub- microns.