发明名称 INSPECTING METHOD AND DEVICE FOR PATTERN
摘要 PURPOSE:To precisely detect a defect of a pattern by interpolating the defect of a binary image pattern stored in a two-dimensional registor to form a pinhole, inverting it and detecting a black point thus inverted. CONSTITUTION:An image pattern is stored as a binary signal in the first two- dimensional register 5, the pattern to be inspected is relatively scanned with respect to the pattern to be detected on the register to produce information, a signal to be interpolated is obtained via an inverter 14 and an AND gate 15, the outputs of both the registers 5, 16 are inputted as an interpolation signal via the second two-dimensional register 16 to an NAND gate 17 to produce an inverted synthetic output, which is applied to a processor 7, and the defect of the image pattern is detected as a black point. In this manner a large projection and a large defect can be automatically accurately detected.
申请公布号 JPS57106125(A) 申请公布日期 1982.07.01
申请号 JP19800183455 申请日期 1980.12.24
申请人 FUJITSU KK 发明人 FUJIWARA KATSUMI;SERIZAWA JIYOUJI
分类号 H05K3/00;G01N21/88;G01N21/93;G01N21/956;G03F1/84;G06T1/00;H01L21/027;H01L21/30;H01L21/66 主分类号 H05K3/00
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