发明名称
摘要 Highly purified ammonia for use in processes for the production of high-precision electronic components is prepared on-site by drawing ammonia vapor from a liquid ammonia reservoir, passing the vapor through a filter capable of filtering out particles of less than 0.005 micron in size, and scrubbing the filtered vapor in a high-pH aqueous liquid-vapor contact unit.
申请公布号 JPH11506411(A) 申请公布日期 1999.06.08
申请号 JP19970500388 申请日期 1995.06.05
申请人 发明人
分类号 C01B21/46;B01D1/00;B01D3/00;B01D3/02;B01D3/14;B01J39/04;B08B7/04;C01B7/07;C01B7/19;C01B15/013;C01C1/02;C01C1/16;F26B7/00;H01L21/304;H01L21/306;H01L21/311 主分类号 C01B21/46
代理机构 代理人
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