| 摘要 |
PURPOSE:To a positive resist which is sensitive for high energy rays and has excellent sensitivity, resolution, durability against plasma etching, and heat resistance by incorporating a specified onium salt, alkali-soluble resin and dissolution preventing agent. CONSTITUTION:This resist material has a three-component material comprising an acid producing agent, alkali-soluble resin, and dissolution preventing agent. The acid producing agent is an onium salt expressed by (R<1>)nMX. The dissolution preventing agent is a polymer expressed by formula. In formula, R<2> is a hydrogen atom, alkyl group of 1-6C, or alkoxy group of 1-6C, R<3> is a hydrogen atom or methyl group, R<4> is a hydrogen atom, COOH, or COOt-Bu group, (t-Bu is a t-butyl group), (m) and (x) to (z) satisfy 0<=m<=0.9, 0<x<=0.9, 0<y<=0.9, 0<=z<=0.5, m+x+y+z=1. The weight average mol.wt. of the polymer expressed by the formula is 500-10000. |
