SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus for preventing a liquid adhered to a substrate by an exposure device from causing poor operation and poor processing, and to provide a substrate processing method. SOLUTION: The substrate processing apparatus 500 comprises an interface block 15. The exposure device 16 is disposed adjacent to the interface block 15. The interface block 15 includes a first and a second cleaning/drying processing unit SD1 and SD2. The first cleaning/drying processing unit SD1 cleans and dries the substrate W prior to exposure processing. The second cleaning/drying processing unit SD2 cleans and dries the substrate W subsequent to the exposure processing. COPYRIGHT: (C)2008,JPO&INPIT