| 摘要 |
The present invention relates to a composition comprising a polymer and a solvent, wherein the polymer comprises a repeating unit represented by Formula (I) below and an end capping group devoid of polymerizable vinyl groups and hydroxyl groups. In the above formula, Ar1, Ar2, Ar3 and Ar4 each independently represent an optionally substituted bidentate aromatic group; X1 and X2 each independently represent a single bond, -O-, -C(O)-, -C(O)O-, OC(O)-, C(O)NR1-, NR2C(O)-, -S-, -S(O)-, SO2-, or an optionally substituted C1-202 valent hydrocarbon group; R1 and R2 each independently represent H or C1-20 hydrocarbyl group; m is 0 or 1; n is 0 or 1; and o is 0 or 1. The present composition is uniquely applicable in the production of semiconductor devices forming low-k and ultralow-k dielectric materials. |
