发明名称 |
STATIC RANDOM ACCESS MEMORY DEVICE AND MANUFACTURE THEREOF |
摘要 |
<p>PROBLEM TO BE SOLVED: To reduce contact resistance and to simplify a manufacturing process by constituting a unit active area of an annular first active area and a second active area bisecting the first active area so as to increasing a contact hole for a power line without increasing the size of a cell. SOLUTION: A unit active area is constituted of an annular first active area and a second active area bisecting first active area. In addition unit active areas are arranged so as to repeat a first column where the unit active areas are arrayed and a second column where unit active areas are arranged to be deviated respectively by 1/2 pitch from the unit active areas arrayed in the first column. Then four cells share the unit active areas of them respectively by 1/4. In addition contact holes C for connecting a power source line to active areas are formed on the second active areas and the four cells share one contact hole C.</p> |
申请公布号 |
JPH0855915(A) |
申请公布日期 |
1996.02.27 |
申请号 |
JP19950189528 |
申请日期 |
1995.07.25 |
申请人 |
SAMSUNG ELECTRON CO LTD |
发明人 |
SHIN NORIMUNE;KIN NAGAMITSU |
分类号 |
H01L21/8244;H01L27/11;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8244 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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