| 摘要 |
<p>A pattern image is generated by pattern image forming apparatuses (10, 12, PL), and at least a part of the generated pattern image or a part of a pattern image generated and formed on a substance is photoelectrically detected by detecting systems (42, 48). Then, a modifying apparatus (32) modifies design data to be inputted to the pattern image generating apparatuses based on the detection results. Therefore, corresponding to the input of the modified design data, the pattern image is generated on the substance (P) by the pattern image generating apparatuses and the substance is exposed with the pattern image. Thus, a desired pattern is accurately formed on the substance.</p> |
