| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner whose optical characteristics, such as throughput and resolution, are superior. SOLUTION: The aligner projects the pattern of a reticle on a processed object, and has a projection optical system having a numerical aperture NA of 0.85 or more. The projection optical system has an optical member on which a reflection preventive film consisting of a plurality of layers is formed. On the surface of the optical member where the reflection preventive film is in contact with a gas, an angle of incident light with the optical member and an angle of outgoing light with the optical member do not exceed a Brewstar angle, which is determined by a relative refraction factor between the outer mostlayer closest to the gas among the layers and the gas. COPYRIGHT: (C)2005,JPO&NCIPI
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